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Mole Fraction and Device Reliability Analysis of Vertical-Tunneling-Attributed Dual-Material Double-Gate Heterojunction-TFET with Si0.7Ge0.3 Source Region at Device and Circuit Level

Km Sucheta Singh, Satyendra Kumar. Mole Fraction and Device Reliability Analysis of Vertical-Tunneling-Attributed Dual-Material Double-Gate Heterojunction-TFET with Si0.7Ge0.3 Source Region at Device and Circuit Level. Journal of Circuits, Systems, and Computers, 33(12), August 2024. [doi]

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