Corrigendum to "Scaling equations for the accurate prediction of CMOS device performance from 180 nm to 7 nm" [Integr. VLSI J. 58. (2017) 74-81]

Aaron Stillmaker, Bevan M. Baas. Corrigendum to "Scaling equations for the accurate prediction of CMOS device performance from 180 nm to 7 nm" [Integr. VLSI J. 58. (2017) 74-81]. Integration, 67:170, 2019. [doi]

Abstract

Abstract is missing.