Xiantao Sun, Weihai Chen, Rui Zhou 0011, Wenjie Chen, Jianbin Zhang. Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography. In 2014 IEEE International Conference on Robotics and Automation, ICRA 2014, Hong Kong, China, May 31 - June 7, 2014. pages 2345-2350, IEEE, 2014. [doi]
@inproceedings{SunC0CZ14-0, title = {Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography}, author = {Xiantao Sun and Weihai Chen and Rui Zhou 0011 and Wenjie Chen and Jianbin Zhang}, year = {2014}, doi = {10.1109/ICRA.2014.6907184}, url = {http://dx.doi.org/10.1109/ICRA.2014.6907184}, researchr = {https://researchr.org/publication/SunC0CZ14-0}, cites = {0}, citedby = {0}, pages = {2345-2350}, booktitle = {2014 IEEE International Conference on Robotics and Automation, ICRA 2014, Hong Kong, China, May 31 - June 7, 2014}, publisher = {IEEE}, }