Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography

Xiantao Sun, Weihai Chen, Rui Zhou 0011, Wenjie Chen, Jianbin Zhang. Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography. In 2014 IEEE International Conference on Robotics and Automation, ICRA 2014, Hong Kong, China, May 31 - June 7, 2014. pages 2345-2350, IEEE, 2014. [doi]

@inproceedings{SunC0CZ14-0,
  title = {Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography},
  author = {Xiantao Sun and Weihai Chen and Rui Zhou 0011 and Wenjie Chen and Jianbin Zhang},
  year = {2014},
  doi = {10.1109/ICRA.2014.6907184},
  url = {http://dx.doi.org/10.1109/ICRA.2014.6907184},
  researchr = {https://researchr.org/publication/SunC0CZ14-0},
  cites = {0},
  citedby = {0},
  pages = {2345-2350},
  booktitle = {2014 IEEE International Conference on Robotics and Automation, ICRA 2014, Hong Kong, China, May 31 - June 7, 2014},
  publisher = {IEEE},
}