Formation of high resistivity phases of nickel silicide at small area

R. Tomita, H. Kimura, M. Yasuda, K. Maeda, S. Ueno, T. Tomizawa, Y. Kunimune, H. Nakamura, M. Moritoki, H. Iwai. Formation of high resistivity phases of nickel silicide at small area. Microelectronics Reliability, 53(5):659-664, 2013. [doi]

Abstract

Abstract is missing.