The impact of GATE thickness variation on FinFET performance parameters

Dhananjaya Tripathy, Debiprasad Priyabrata Acharya, Prakash Kumar Rout, Debasish Nayak. The impact of GATE thickness variation on FinFET performance parameters. In 19th OITS International Conference on Information Technology, OCIT 2019, Bhubaneswar, India, December 16-18, 2021. pages 1-5, IEEE, 2021. [doi]

@inproceedings{TripathyARN21,
  title = {The impact of GATE thickness variation on FinFET performance parameters},
  author = {Dhananjaya Tripathy and Debiprasad Priyabrata Acharya and Prakash Kumar Rout and Debasish Nayak},
  year = {2021},
  doi = {10.1109/OCIT53463.2021.00012},
  url = {https://doi.org/10.1109/OCIT53463.2021.00012},
  researchr = {https://researchr.org/publication/TripathyARN21},
  cites = {0},
  citedby = {0},
  pages = {1-5},
  booktitle = {19th OITS International Conference on Information Technology, OCIT 2019, Bhubaneswar, India, December 16-18, 2021},
  publisher = {IEEE},
  isbn = {978-1-6654-1664-1},
}