Robust two-time scale control system design for reactive Ion etching system

N. Tudoroiu, K. Khorasani, V. Yurkevich. Robust two-time scale control system design for reactive Ion etching system. In 7th European Control Conference, ECC 2003, Cambridge, UK, September 1-4, 2003. pages 1193-1198, IEEE, 2003. [doi]

Abstract

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