Li Wang, H. Schift, P. M. Kristiansen, K. Jefimovs, H. H. Solak, J. Gobrecht, Y. Ekinci. Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography. In 8th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2013, Suzhou, China, April 7-10, 2013. pages 1232-1235, IEEE, 2013. [doi]
Abstract is missing.