Characteristics of high Al content Al::x::Ga::1-x::N grown by metalorganic chemical vapor deposition

Xiaoyan Wang, Xiaoliang Wang, Guoxin Hu, Baozhu Wang, Zhiyong Ma, Hongling Xiao, Cuimei Wang, Junxue Ran, Jianping Li. Characteristics of high Al content Al::x::Ga::1-x::N grown by metalorganic chemical vapor deposition. Microelectronics Journal, 38(8-9):838-841, 2007. [doi]

Abstract

Abstract is missing.