Degradation behavior and mechanism of polymer films for high-ohmic resistor protection in a heat and humid environment

X. Y. Wang, H. Zhang, X. P. Ma, Q. Cheng, C. G. Li, M.-X. Li, T. N. Chen, P. Zhang, J. Q. Shao. Degradation behavior and mechanism of polymer films for high-ohmic resistor protection in a heat and humid environment. Microelectronics Reliability, 57:79-85, 2016. [doi]

Abstract

Abstract is missing.