Wenke Weinreich, Konrad Seidel, Patrick Polakowski, Stefan Riedel, Lutz Wilde, Dina H. Triyoso, Mark G. Nolan. ALD ZrO2 processes for BEoL device applications. In 2014 IEEE International Conference on IC Design & Technology, ICICDT 2014, Austin, TX, USA, May 28-30, 2014. pages 1-4, IEEE, 2014. [doi]
Abstract is missing.