Li Wen, Qiuping Zhang, Weiwei Xiang, Hai Wang, Jiaru Chu. Design and fabrication of the microplasma reactor for maskless scanning plasma etching. In 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2009, Shenzhen, China, January 5-8, 2009. pages 577-580, IEEE, 2009. [doi]
Abstract is missing.