Breakdown and latent damage of ultra-thin gate oxides under ESD stress conditions

Jie Wu, Patrick Juliano, Elyse Rosenbaum. Breakdown and latent damage of ultra-thin gate oxides under ESD stress conditions. Microelectronics Reliability, 41(11):1771-1779, 2001. [doi]

Authors

Jie Wu

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Patrick Juliano

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Elyse Rosenbaum

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