Layout Decomposition Co-Optimization for Hybrid E-Beam and Multiple Patterning Lithography

Yunfeng Yang, Wai-Shing Luk, David Z. Pan, Hai Zhou, Changhao Yan, Dian Zhou, Xuan Zeng. Layout Decomposition Co-Optimization for Hybrid E-Beam and Multiple Patterning Lithography. IEEE Trans. on CAD of Integrated Circuits and Systems, 35(9):1532-1545, 2016. [doi]

Abstract

Abstract is missing.