Cadmus A. Yuan, Olaf van der Sluis, G. Q. (Kouchi) Zhang, Leo J. Ernst, Willem D. van Driel, Richard B. R. van Silfhout. Molecular simulation on the material/interfacial strength of the low-dielectric materials. Microelectronics Reliability, 47(9-11):1483-1491, 2007. [doi]
Abstract is missing.