Self-aligned double patterning decomposition for overlay minimization and hot spot detection

Hongbo Zhang, Yuelin Du, Martin D. F. Wong, Rasit Onur Topaloglu. Self-aligned double patterning decomposition for overlay minimization and hot spot detection. In Leon Stok, Nikil D. Dutt, Soha Hassoun, editors, Proceedings of the 48th Design Automation Conference, DAC 2011, San Diego, California, USA, June 5-10, 2011. pages 71-76, ACM, 2011. [doi]

Abstract

Abstract is missing.