C. H. Zhang, Sunao Katsuki, H. Horta, H. Imamura, Hidenori Akiyama. High-Power EUV Source for Lithography Using Tin Target. In Industry Applications Society Annual Meeting, IAS 2008, Edmonton, Alberta, Canada, 5-9 Octobert, 2008. pages 1-4, IEEE, 2008. [doi]
Abstract is missing.