Comparison of single-event transients of T-gate core and IO device in 130 nm partially depleted silicon-on-insulator technology

Yunlong Zheng, Ruofan Dai, Zhuojun Chen, Shulong Sun, Zheng Wang, Zehua Sang, Min Lin, Shichang Zou. Comparison of single-event transients of T-gate core and IO device in 130 nm partially depleted silicon-on-insulator technology. IEICE Electronic Express, 13(12):20160424, 2016. [doi]

@article{ZhengDCSWSLZ16,
  title = {Comparison of single-event transients of T-gate core and IO device in 130 nm partially depleted silicon-on-insulator technology},
  author = {Yunlong Zheng and Ruofan Dai and Zhuojun Chen and Shulong Sun and Zheng Wang and Zehua Sang and Min Lin and Shichang Zou},
  year = {2016},
  doi = {10.1587/elex.13.20160424},
  url = {http://dx.doi.org/10.1587/elex.13.20160424},
  researchr = {https://researchr.org/publication/ZhengDCSWSLZ16},
  cites = {0},
  citedby = {0},
  journal = {IEICE Electronic Express},
  volume = {13},
  number = {12},
  pages = {20160424},
}