SiGe Gate-All-around Nanosheet Reliability

Huimei Zhou, Miaomiao Wang, Ruqiang Bao, Curtis Durfee, Liqiao Qin, Jingyun Zhang. SiGe Gate-All-around Nanosheet Reliability. In IEEE International Reliability Physics Symposium, IRPS 2022, Dallas, TX, USA, March 27-31, 2022. pages 60-1, IEEE, 2022. [doi]

Abstract

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