Low Temperature Hetero-Epitaxy of Ferromagnetic Silicide on Ge Substrates for Spin-Transistor Application

Yu-ichiro Ando, Koji Ueda, Mamoru Kumano, Taizoh Sadoh, Kazumasa Narumi, Yoshihito Maeda, Masanobu Miyao. Low Temperature Hetero-Epitaxy of Ferromagnetic Silicide on Ge Substrates for Spin-Transistor Application. IEICE Transactions, 91-C(5):708-711, 2008. [doi]

@article{AndoUKSNMM08,
  title = {Low Temperature Hetero-Epitaxy of Ferromagnetic Silicide on Ge Substrates for Spin-Transistor Application},
  author = {Yu-ichiro Ando and Koji Ueda and Mamoru Kumano and Taizoh Sadoh and Kazumasa Narumi and Yoshihito Maeda and Masanobu Miyao},
  year = {2008},
  doi = {10.1093/ietele/e91-c.5.708},
  url = {http://dx.doi.org/10.1093/ietele/e91-c.5.708},
  researchr = {https://researchr.org/publication/AndoUKSNMM08},
  cites = {0},
  citedby = {0},
  journal = {IEICE Transactions},
  volume = {91-C},
  number = {5},
  pages = {708-711},
}