Lithography-aware layout compaction

Curtis Andrus, Matthew R. Guthaus. Lithography-aware layout compaction. In Erik Brunvard, Ken Stevens, Joseph R. Cavallaro, Tong Zhang 0002, editors, Great Lakes Symposium on VLSI 2012, GLSVLSI'12, Salt Lake Cit, UT, USA, May 3-4, 2012. pages 147-152, ACM, 2012. [doi]

@inproceedings{AndrusG12,
  title = {Lithography-aware layout compaction},
  author = {Curtis Andrus and Matthew R. Guthaus},
  year = {2012},
  doi = {10.1145/2206781.2206818},
  url = {http://doi.acm.org/10.1145/2206781.2206818},
  researchr = {https://researchr.org/publication/AndrusG12},
  cites = {0},
  citedby = {0},
  pages = {147-152},
  booktitle = {Great Lakes Symposium on VLSI 2012, GLSVLSI'12, Salt Lake Cit, UT, USA, May 3-4, 2012},
  editor = {Erik Brunvard and Ken Stevens and Joseph R. Cavallaro and Tong Zhang 0002},
  publisher = {ACM},
  isbn = {978-1-4503-1244-8},
}