M. R. Carriero, S. Di Pascoli, Giuseppe Iannaccone. Simulation of failure time distributions of metal lines under electromigration. Microelectronics Reliability, 42(9-11):1469-1472, 2002. [doi]
@article{CarrieroPI02,
title = {Simulation of failure time distributions of metal lines under electromigration},
author = {M. R. Carriero and S. Di Pascoli and Giuseppe Iannaccone},
year = {2002},
doi = {10.1016/S0026-2714(02)00172-5},
url = {http://dx.doi.org/10.1016/S0026-2714(02)00172-5},
researchr = {https://researchr.org/publication/CarrieroPI02},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {42},
number = {9-11},
pages = {1469-1472},
}