Double patterning lithography-aware analog placement

Hsing-Chih Chang Chien, Hung-Chih Ou, Tung-Chieh Chen, Ta-Yu Kuan, Yao-Wen Chang. Double patterning lithography-aware analog placement. In The 50th Annual Design Automation Conference 2013, DAC '13, Austin, TX, USA, May 29 - June 07, 2013. pages 4, ACM, 2013. [doi]

@inproceedings{ChienOCKC13,
  title = {Double patterning lithography-aware analog placement},
  author = {Hsing-Chih Chang Chien and Hung-Chih Ou and Tung-Chieh Chen and Ta-Yu Kuan and Yao-Wen Chang},
  year = {2013},
  doi = {10.1145/2463209.2488738},
  url = {http://doi.acm.org/10.1145/2463209.2488738},
  researchr = {https://researchr.org/publication/ChienOCKC13},
  cites = {0},
  citedby = {0},
  pages = {4},
  booktitle = {The 50th Annual Design Automation Conference 2013, DAC '13, Austin, TX, USA, May 29 - June 07, 2013},
  publisher = {ACM},
  isbn = {978-1-4503-2071-9},
}