An Evolutionary Approach to Process Control with Application to Lithography

Jerome Doutriaux, Abrahim Lavi. An Evolutionary Approach to Process Control with Application to Lithography. IEEE Transactions on Systems, Man, and Cybernetics, Part A, 4(2):176-185, 1974. [doi]

@article{DoutriauxL74,
  title = {An Evolutionary Approach to Process Control with Application to Lithography},
  author = {Jerome Doutriaux and Abrahim Lavi},
  year = {1974},
  doi = {10.1109/TSMC.1974.5409112},
  url = {http://dx.doi.org/10.1109/TSMC.1974.5409112},
  researchr = {https://researchr.org/publication/DoutriauxL74},
  cites = {0},
  citedby = {0},
  journal = {IEEE Transactions on Systems, Man, and Cybernetics, Part A},
  volume = {4},
  number = {2},
  pages = {176-185},
}