Daniel Durini, Werner Brockherde, Bedrich J. Hosticka. Charge-injection photogate pixel fabricated in CMOS silicon-on-insulator technology. I. J. Circuit Theory and Applications, 37(2):179-192, 2009. [doi]
@article{DuriniBH09,
title = {Charge-injection photogate pixel fabricated in CMOS silicon-on-insulator technology},
author = {Daniel Durini and Werner Brockherde and Bedrich J. Hosticka},
year = {2009},
doi = {10.1002/cta.538},
url = {https://doi.org/10.1002/cta.538},
researchr = {https://researchr.org/publication/DuriniBH09},
cites = {0},
citedby = {0},
journal = {I. J. Circuit Theory and Applications},
volume = {37},
number = {2},
pages = {179-192},
}