V. Filip, Hei Wong, D. Nicolaescu. Definition of curve fitting parameter to study tunneling and trapping of electrons in Si/ultra-thin SiO::2::/metal structures. Microelectronics Reliability, 46(7):1027-1034, 2006. [doi]
@article{FilipWN06,
title = {Definition of curve fitting parameter to study tunneling and trapping of electrons in Si/ultra-thin SiO::2::/metal structures},
author = {V. Filip and Hei Wong and D. Nicolaescu},
year = {2006},
doi = {10.1016/j.microrel.2005.10.014},
url = {http://dx.doi.org/10.1016/j.microrel.2005.10.014},
researchr = {https://researchr.org/publication/FilipWN06},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {46},
number = {7},
pages = {1027-1034},
}