Optimization and simulation of exposure pattern for scanning laser lithography - researchr publication authors

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Omid T. Ghalehbeygi, Garth Berriman, Andrew J. Fleming, John L. Holdsworth. Optimization and simulation of exposure pattern for scanning laser lithography. In 2015 IEEE Conference on Control Applications, CCA 2015, Sydney, Australia, September 21-23, 2015. pages 1868-1873, IEEE, 2015. [doi]

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