A New Visibility Partition for Affine Pattern Matching

Michiel Hagedoorn, Mark H. Overmars, Remco C. Veltkamp. A New Visibility Partition for Affine Pattern Matching. In Gunilla Borgefors, Ingela Nyström, Gabriella Sanniti di Baja, editors, Discrete Geometry for Computer Imagery, 9th International Conference, DGCI 2000, Uppsala, Sweden, December 13-15, 2000, Proceedings. Volume 1953 of Lecture Notes in Computer Science, pages 358-370, Springer, 2000. [doi]

Authors

Michiel Hagedoorn

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Mark H. Overmars

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Remco C. Veltkamp

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