Matthew Horridge, Bijan Parsia, Ulrike Sattler. Justification Masking in OWL. In Volker Haarslev, David Toman, Grant E. Weddell, editors, Proceedings of the 23rd International Workshop on Description Logics (DL 2010), Waterloo, Ontario, Canada, May 4-7, 2010. Volume 573 of CEUR Workshop Proceedings, CEUR-WS.org, 2010. [doi]
No references recorded for this publication.
No citations of this publication recorded.