Yuxin Jiang, Qinglin Sun, Xiaolei Zhang, Zengqiang Chen. Pressure Regulation for Oxygen Mask Based on Active Disturbance Rejection Control. IEEE Transactions on Industrial Electronics, 64(8):6402-6411, 2017. [doi]
@article{JiangSZC17,
title = {Pressure Regulation for Oxygen Mask Based on Active Disturbance Rejection Control},
author = {Yuxin Jiang and Qinglin Sun and Xiaolei Zhang and Zengqiang Chen},
year = {2017},
doi = {10.1109/TIE.2017.2677323},
url = {https://doi.org/10.1109/TIE.2017.2677323},
researchr = {https://researchr.org/publication/JiangSZC17},
cites = {0},
citedby = {0},
journal = {IEEE Transactions on Industrial Electronics},
volume = {64},
number = {8},
pages = {6402-6411},
}