Development and Characterization of High Temperature Plasma Nitridation Process for Advanced CMOS Technology Application - researchr publication authors

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Xiaoxu Kang, Xiaolan Zhong, Zhangfa Chen, Zhengkai Dao, Qiang Zhang, Hao Wan, Yamin Zhou, Ming Li, Yingjia Guo, Ran Nie, Tao Wu. Development and Characterization of High Temperature Plasma Nitridation Process for Advanced CMOS Technology Application. In Fan Ye, Ting-Ao Tang, editors, 14th IEEE International Conference on ASIC, ASICON 2021, Kunming, China, October 26-29, 2021. pages 1-3, IEEE, 2021. [doi]

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