Kyungmee O. Kim, Way Kuo, Wen Luo. A relation model of gate oxide yield and reliability. Microelectronics Reliability, 44(3):425-434, 2004. [doi]
@article{KimKL04,
title = {A relation model of gate oxide yield and reliability},
author = {Kyungmee O. Kim and Way Kuo and Wen Luo},
year = {2004},
doi = {10.1016/j.microrel.2003.09.009},
url = {http://dx.doi.org/10.1016/j.microrel.2003.09.009},
tags = {reliability},
researchr = {https://researchr.org/publication/KimKL04},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {44},
number = {3},
pages = {425-434},
}