Richard Kimmel, Tong Li, David Winston. An Enhanced Machine Learning Model for Adaptive Monte Carlo Yield Analysis. In Ulf Schlichtmann, Raviv Gal, Hussam Amrouch, Hai (Helen) Li, editors, MLCAD '20: 2020 ACM/IEEE Workshop on Machine Learning for CAD, Virtual Event, Iceland, November 16-20, 2020. pages 89-94, ACM, 2020. [doi]
@inproceedings{KimmelLW20,
title = {An Enhanced Machine Learning Model for Adaptive Monte Carlo Yield Analysis},
author = {Richard Kimmel and Tong Li and David Winston},
year = {2020},
doi = {10.1145/3380446.3430635},
url = {https://doi.org/10.1145/3380446.3430635},
researchr = {https://researchr.org/publication/KimmelLW20},
cites = {0},
citedby = {0},
pages = {89-94},
booktitle = {MLCAD '20: 2020 ACM/IEEE Workshop on Machine Learning for CAD, Virtual Event, Iceland, November 16-20, 2020},
editor = {Ulf Schlichtmann and Raviv Gal and Hussam Amrouch and Hai (Helen) Li},
publisher = {ACM},
isbn = {978-1-4503-7519-1},
}