Hao Li 0012, Mifang Cong, Ke Li, Huan Du. Source engineering on ruggedness and RF performance of n-channel RFLDMOS. Microelectronics Reliability, 87:57-63, 2018. [doi]
@article{LiCLD18,
title = {Source engineering on ruggedness and RF performance of n-channel RFLDMOS},
author = {Hao Li 0012 and Mifang Cong and Ke Li and Huan Du},
year = {2018},
doi = {10.1016/j.microrel.2018.06.001},
url = {https://doi.org/10.1016/j.microrel.2018.06.001},
researchr = {https://researchr.org/publication/LiCLD18},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {87},
pages = {57-63},
}