Ge surface passivation by GeO2 fabricated by N2O plasma oxidation

Meng Lin, Xia An, Ming Li, Quanxin Yun, Min Li, Zhiqiang Li, Pengqiang Liu, Xing Zhang, Ru Huang. Ge surface passivation by GeO2 fabricated by N2O plasma oxidation. Science in China Series F: Information Sciences, 58(4):1-5, 2015. [doi]

@article{LinALYLLLZH15,
  title = {Ge surface passivation by GeO2 fabricated by N2O plasma oxidation},
  author = {Meng Lin and Xia An and Ming Li and Quanxin Yun and Min Li and Zhiqiang Li and Pengqiang Liu and Xing Zhang and Ru Huang},
  year = {2015},
  doi = {10.1007/s11432-014-5180-y},
  url = {http://dx.doi.org/10.1007/s11432-014-5180-y},
  researchr = {https://researchr.org/publication/LinALYLLLZH15},
  cites = {0},
  citedby = {0},
  journal = {Science in China Series F: Information Sciences},
  volume = {58},
  number = {4},
  pages = {1-5},
}