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175% Modeling for Product-Line Evolution of Domain Artifacts

Sascha Lity, Sophia Nahrendorf, Thomas Thüm, Christoph Seidl, Ina Schaefer. 175% Modeling for Product-Line Evolution of Domain Artifacts. In Rafael Capilla, Malte Lochau, Lidia Fuentes, editors, Proceedings of the 12th International Workshop on Variability Modelling of Software-Intensive Systems, VAMOS 2018, Madrid, Spain, February 7-9, 2018. pages 27-34, ACM, 2018. [doi]

Authors

Sascha Lity

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Sophia Nahrendorf

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Thomas Thüm

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Christoph Seidl

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Ina Schaefer

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