Xu Ma, Yihua Pan, Shengen Zhang, Javier Garcia-Frías, Gonzalo R. Arce. Informational Lithography Approach Based on Source and Mask Optimization. IEEE Trans. Computational Imaging, 7:32-42, 2021. [doi]
@article{MaPZGA21, title = {Informational Lithography Approach Based on Source and Mask Optimization}, author = {Xu Ma and Yihua Pan and Shengen Zhang and Javier Garcia-Frías and Gonzalo R. Arce}, year = {2021}, doi = {10.1109/TCI.2020.3048271}, url = {https://doi.org/10.1109/TCI.2020.3048271}, researchr = {https://researchr.org/publication/MaPZGA21}, cites = {0}, citedby = {0}, journal = {IEEE Trans. Computational Imaging}, volume = {7}, pages = {32-42}, }