Characterization of Negative Photoresist Processing by Statistical Design of Experiment (DOE)

Sei-Young Mun, Gwang-Beom Kim, Dea-Wha Soh, Sang Jeen Hong. Characterization of Negative Photoresist Processing by Statistical Design of Experiment (DOE). J. Inform. and Commun. Convergence Engineering, 3(4):191-194, 2005. [doi]

Authors

Sei-Young Mun

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Gwang-Beom Kim

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Dea-Wha Soh

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Sang Jeen Hong

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