Thomas Pompl, Michael Röhner. Voltage acceleration of time-dependent breakdown of ultra-thin gate dielectrics. Microelectronics Reliability, 45(12):1835-1841, 2005. [doi]
@article{PomplR05,
title = {Voltage acceleration of time-dependent breakdown of ultra-thin gate dielectrics},
author = {Thomas Pompl and Michael Röhner},
year = {2005},
doi = {10.1016/j.microrel.2005.04.007},
url = {http://dx.doi.org/10.1016/j.microrel.2005.04.007},
researchr = {https://researchr.org/publication/PomplR05},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {45},
number = {12},
pages = {1835-1841},
}