Bin Qin, Qinghu Chen, RuXia Shan, Xin Wang. The Reaction Rate Model of Volatile Kiln Based on SVR. In ICITEE-2019: 2nd International Conference on Information Technologies and Electrical Engineering, Zhuzhou, Hunan, China, December 6-7, 2019. ACM, 2019. [doi]
@inproceedings{QinCSW19-0,
title = {The Reaction Rate Model of Volatile Kiln Based on SVR},
author = {Bin Qin and Qinghu Chen and RuXia Shan and Xin Wang},
year = {2019},
doi = {10.1145/3386415.3387069},
url = {https://doi.org/10.1145/3386415.3387069},
researchr = {https://researchr.org/publication/QinCSW19-0},
cites = {0},
citedby = {0},
booktitle = {ICITEE-2019: 2nd International Conference on Information Technologies and Electrical Engineering, Zhuzhou, Hunan, China, December 6-7, 2019},
publisher = {ACM},
isbn = {978-1-4503-7293-0},
}