Reduction of drain induced barrier lowering by optimization Trimetal- GAA -Si -NW MOSFET in multimedia tools

Davinder Singh Rathee, Ritu Yadav, Kiran Ahuja. Reduction of drain induced barrier lowering by optimization Trimetal- GAA -Si -NW MOSFET in multimedia tools. Multimedia Tools Appl., 81(14):19849-19862, 2022. [doi]

@article{RatheeYA22,
  title = {Reduction of drain induced barrier lowering by optimization Trimetal- GAA -Si -NW MOSFET in multimedia tools},
  author = {Davinder Singh Rathee and Ritu Yadav and Kiran Ahuja},
  year = {2022},
  doi = {10.1007/s11042-021-11518-3},
  url = {https://doi.org/10.1007/s11042-021-11518-3},
  researchr = {https://researchr.org/publication/RatheeYA22},
  cites = {0},
  citedby = {0},
  journal = {Multimedia Tools Appl.},
  volume = {81},
  number = {14},
  pages = {19849-19862},
}