Dongxu Ren, Zexiang Zhao, Bin Li, Wenhan Zeng. Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating. In Hui Yu 0001, editor, 25th International Conference on Automation and Computing, ICAC 2019, Lancaster, United Kingdom, September 5-7, 2019. pages 1-5, IEEE, 2019. [doi]
@inproceedings{RenZLZ19,
title = {Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating},
author = {Dongxu Ren and Zexiang Zhao and Bin Li and Wenhan Zeng},
year = {2019},
doi = {10.23919/IConAC.2019.8895223},
url = {https://doi.org/10.23919/IConAC.2019.8895223},
researchr = {https://researchr.org/publication/RenZLZ19},
cites = {0},
citedby = {0},
pages = {1-5},
booktitle = {25th International Conference on Automation and Computing, ICAC 2019, Lancaster, United Kingdom, September 5-7, 2019},
editor = {Hui Yu 0001},
publisher = {IEEE},
isbn = {978-1-8613-7665-7},
}