Cuprous Oxide Thin Films Deposited by Chemical Bath Deposition: Effect of Temperature and TEA

Odín Reyes-Vallejo, Rocío M. Sánchez-Albores, A. Ashok, Arturo Fernández-Madrigal, José Juan Díaz, Wilber Montejo-López, Salvador Escobar, P. J. Sebastian. Cuprous Oxide Thin Films Deposited by Chemical Bath Deposition: Effect of Temperature and TEA. In 20th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2023, Mexico City, Mexico, October 25-27, 2023. pages 1-6, IEEE, 2023. [doi]

@inproceedings{ReyesVallejoSAFDMES23,
  title = {Cuprous Oxide Thin Films Deposited by Chemical Bath Deposition: Effect of Temperature and TEA},
  author = {Odín Reyes-Vallejo and Rocío M. Sánchez-Albores and A. Ashok and Arturo Fernández-Madrigal and José Juan Díaz and Wilber Montejo-López and Salvador Escobar and P. J. Sebastian},
  year = {2023},
  doi = {10.1109/CCE60043.2023.10332836},
  url = {https://doi.org/10.1109/CCE60043.2023.10332836},
  researchr = {https://researchr.org/publication/ReyesVallejoSAFDMES23},
  cites = {0},
  citedby = {0},
  pages = {1-6},
  booktitle = {20th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2023, Mexico City, Mexico, October 25-27, 2023},
  publisher = {IEEE},
  isbn = {979-8-3503-0676-7},
}