Mark S. Robbins, Pritesh Mistry, Paul R. Jorden. Detailed characterisation of a new large area CCD manufactured on high resistivity silicon. In Ralf Widenhorn, Valérie Nguyen, editors, Sensors, Cameras, and Systems for Industrial, Scientific, and Consumer Applications XII, San Francisco Airport, California, USA, January 23-27, 2011. Volume 7875 of SPIE Proceedings, pages 787507, SPIE, 2011. [doi]
@inproceedings{RobbinsMJ11,
title = {Detailed characterisation of a new large area CCD manufactured on high resistivity silicon},
author = {Mark S. Robbins and Pritesh Mistry and Paul R. Jorden},
year = {2011},
doi = {10.1117/12.876627},
url = {https://doi.org/10.1117/12.876627},
researchr = {https://researchr.org/publication/RobbinsMJ11},
cites = {0},
citedby = {0},
pages = {787507},
booktitle = {Sensors, Cameras, and Systems for Industrial, Scientific, and Consumer Applications XII, San Francisco Airport, California, USA, January 23-27, 2011},
editor = {Ralf Widenhorn and Valérie Nguyen},
volume = {7875},
series = {SPIE Proceedings},
publisher = {SPIE},
isbn = {9780819484123},
}