Dick de Roover, Abbas Emami-Naeini, Jon L. Ebert. Model-based control for chemical-mechanical planarization (CMP). In Proceedings of the 2004 American Control Conference, ACC 2004, Boston, MA, USA, June 30 - July 2, 2004. pages 3922-3929, IEEE, 2004. [doi]
@inproceedings{RooverEE04,
title = {Model-based control for chemical-mechanical planarization (CMP)},
author = {Dick de Roover and Abbas Emami-Naeini and Jon L. Ebert},
year = {2004},
doi = {10.23919/ACC.2004.1383922},
url = {https://doi.org/10.23919/ACC.2004.1383922},
researchr = {https://researchr.org/publication/RooverEE04},
cites = {0},
citedby = {0},
pages = {3922-3929},
booktitle = {Proceedings of the 2004 American Control Conference, ACC 2004, Boston, MA, USA, June 30 - July 2, 2004},
publisher = {IEEE},
isbn = {0-7803-8335-4},
}