Photo-CVD process for ultra thin SiO::2:: films

V. Sánchez, J. Munguía, M. Estrada. Photo-CVD process for ultra thin SiO::2:: films. Microelectronics Reliability, 44(5):885-888, 2004. [doi]

@article{SanchezME04,
  title = {Photo-CVD process for ultra thin SiO::2:: films},
  author = {V. Sánchez and J. Munguía and M. Estrada},
  year = {2004},
  doi = {10.1016/j.microrel.2004.02.003},
  url = {http://dx.doi.org/10.1016/j.microrel.2004.02.003},
  researchr = {https://researchr.org/publication/SanchezME04},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {44},
  number = {5},
  pages = {885-888},
}