Rapid-Thermal Annealing of Amorphous Silicon on Oxide Semiconductors

Saurabh Saxena, Jin Jang. Rapid-Thermal Annealing of Amorphous Silicon on Oxide Semiconductors. IEICE Transactions, 93-C(10):1495-1498, 2010. [doi]

@article{SaxenaJ10,
  title = {Rapid-Thermal Annealing of Amorphous Silicon on Oxide Semiconductors},
  author = {Saurabh Saxena and Jin Jang},
  year = {2010},
  url = {http://search.ieice.org/bin/summary.php?id=e93-c_10_1495},
  researchr = {https://researchr.org/publication/SaxenaJ10},
  cites = {0},
  citedby = {0},
  journal = {IEICE Transactions},
  volume = {93-C},
  number = {10},
  pages = {1495-1498},
}