Parametric Optimization of Magnetic Abrasive Finishing Process Using Genetic Algorithm and Particle Swarm Optimization

Gopal Kumar Saxenaa, Anjaneyulu Kamepalli, Venkatesh Gudipadu, Satish Kumar Injeti, Ramalingaswamy Cheruku. Parametric Optimization of Magnetic Abrasive Finishing Process Using Genetic Algorithm and Particle Swarm Optimization. In IEEE Region 10 Conference, TENCON 2023, Chiang Mai, Thailand, October 31 - Nov. 3, 2023. pages 651-656, IEEE, 2023. [doi]

@inproceedings{SaxenaaKGIC23,
  title = {Parametric Optimization of Magnetic Abrasive Finishing Process Using Genetic Algorithm and Particle Swarm Optimization},
  author = {Gopal Kumar Saxenaa and Anjaneyulu Kamepalli and Venkatesh Gudipadu and Satish Kumar Injeti and Ramalingaswamy Cheruku},
  year = {2023},
  doi = {10.1109/TENCON58879.2023.10322459},
  url = {https://doi.org/10.1109/TENCON58879.2023.10322459},
  researchr = {https://researchr.org/publication/SaxenaaKGIC23},
  cites = {0},
  citedby = {0},
  pages = {651-656},
  booktitle = {IEEE Region 10 Conference, TENCON 2023, Chiang Mai, Thailand, October 31 - Nov. 3, 2023},
  publisher = {IEEE},
  isbn = {979-8-3503-0219-6},
}