A dispatching rule for photolithography scheduling with an on-line rework strategy

D. Y. Sha, S. Y. Hsu, Z. H. Che, C.-H. Chen. A dispatching rule for photolithography scheduling with an on-line rework strategy. Computers & Industrial Engineering, 50(3):233-247, 2006. [doi]

@article{ShaHCC06,
  title = {A dispatching rule for photolithography scheduling with an on-line rework strategy},
  author = {D. Y. Sha and S. Y. Hsu and Z. H. Che and C.-H. Chen},
  year = {2006},
  doi = {10.1016/j.cie.2006.04.002},
  url = {http://dx.doi.org/10.1016/j.cie.2006.04.002},
  researchr = {https://researchr.org/publication/ShaHCC06},
  cites = {0},
  citedby = {0},
  journal = {Computers & Industrial Engineering},
  volume = {50},
  number = {3},
  pages = {233-247},
}