H. De Waard, W. L. De Koning. Optimal control of the wafer temperatures in diffusion/LPCVD reactors. Automatica, 28(2):243-253, 1992. [doi]
@article{WaardK92,
title = {Optimal control of the wafer temperatures in diffusion/LPCVD reactors},
author = {H. De Waard and W. L. De Koning},
year = {1992},
doi = {10.1016/0005-1098(92)90112-S},
url = {http://dx.doi.org/10.1016/0005-1098(92)90112-S},
researchr = {https://researchr.org/publication/WaardK92},
cites = {0},
citedby = {0},
journal = {Automatica},
volume = {28},
number = {2},
pages = {243-253},
}