MaskPlus: Improving Mask Generation for Instance Segmentation

Shichao Xu, Shuyue Lan, Qi Zhu 0002. MaskPlus: Improving Mask Generation for Instance Segmentation. In IEEE Winter Conference on Applications of Computer Vision, WACV 2020, Snowmass Village, CO, USA, March 1-5, 2020. pages 2019-2027, IEEE, 2020. [doi]

@inproceedings{XuL020,
  title = {MaskPlus: Improving Mask Generation for Instance Segmentation},
  author = {Shichao Xu and Shuyue Lan and Qi Zhu 0002},
  year = {2020},
  doi = {10.1109/WACV45572.2020.9093379},
  url = {https://doi.org/10.1109/WACV45572.2020.9093379},
  researchr = {https://researchr.org/publication/XuL020},
  cites = {0},
  citedby = {0},
  pages = {2019-2027},
  booktitle = {IEEE Winter Conference on Applications of Computer Vision, WACV 2020, Snowmass Village, CO, USA, March 1-5, 2020},
  publisher = {IEEE},
  isbn = {978-1-7281-6553-0},
}